Pure niobium Sputter target
Target for spraying niobium
Niobium Sputtering Target is made using EB melting technology, it is
usually used for touch screens, optical lenses and glass coatings,
usually used for touch screens, optical lenses and glass coatings. XK is
a professional manufacturer of niobium sputtering targets of various
shapes and degrees of purity, which are mainly used in the semiconductor
and microelectronic industries.
Thanks to the special molding processes we used, our niobium sputtering
targets have a higher density, smaller average particle size, and high
purity, and as a result you can benefit from a faster process due to a
higher sputtering speed and get very uniform niobium layers.
The flexibility of our manufacturing process allows us to adjust the
microstructure of our coating material to achieve the desired effect. If
the grain of the spray target is evenly aligned, the user can benefit
from constant erosion rates and uniform layers. The figure below shows
two typical micrographs of our niobium sputtering target, with an
average grain size of ＜ 100 μm.
Chemical purity is critical for metal sputtering targets, if the purity
is higher, the films you have have a more outstanding level of
electrical conductivity and minimize particle formation during the PVD
process. Below is a typical certificate of analysis of a target for
sputtering high purity niobium .
PHYSICAL PROPERTIES
PHASE - Solid
Standard Atomic Weight - Solid
Standard atomic weight - 92.90638 (2) g-mol-1
Melting TEMP - 2750 K, 2477 ° C, 4491 ° F
Boiling Point - 5017 K, 4744 ° C, 8571 ° F
CRYSTAL STRUCTURE - The cubic center of the body
ELECTRICAL DURABILITY - (0 ° C) 152 nOhm · m
HEAT CONDUCTIVITY - (300 K) 53.7 W · m - 1 · K - 1
THERMAL EXPANSION - 7.3 μm / (m · K)
GENERAL PROPERTIES
SYMBOL - Nb
ROOM - 41
ELEMENT CATEGORY: - Transition metals
AVAILABLE PRICES:
Commercial grade (ASTM)
3N 99.9%
GENERAL CHARACTERISTICS
ASTM R04210
o >>Commercial grade (unalloyed)
ASTM R04200
o >>Degree of reactor (unalloyed)
ASTM R04261
o >>Commercial grade niobium 1% zirconium alloy
ASTM R04220
o >>RRR class of pure niobium
AVAILABLE ALLOYS:
Niobium
Niobium 1% zirconium
Niobium
Cobalt
Iron
Carbon
Sulfur
Copper
Zinc
Lead
Total Impurities
99.99
<0.00002
0.002
<0.01
0.0002
0.00005
0.00005
0.00002
<0.01
Diam
thickness
length
width
purity
Details
Foil
0.03mm -0.8mm
>3000mm
2mm-150mm
99.99%
Details
sheet
0.03mm-50mm
100mm
100mm
99.99%
Details
wire
0.025mm
-0.05mm
7000-8000m
99.99%
Details
Stab
2.0mm
-150mm
<1000mm
99.99%
Details
powder
50nm- 20μm
99.99%
Details
Pellets
6mm-13mm
99.99%
Details
granules
6mm-13mm
99.99%
Details
Sputter
target
3mm-300mm
O30--2000mm
99.99%
Details
crucible
30ml-50ml
99.9%
Details
mesh
0.05-2mm
hole:0.3X0.6mm, 0.5X1mm
............20X40mm
99.9%
Details
foam
0.3-10mm
100mm
100mm
Details
Target for spraying niobium
Niobium Sputtering Target is made using EB melting technology, it is
usually used for touch screens, optical lenses and glass coatings,
usually used for touch screens, optical lenses and glass coatings. XK is
a professional manufacturer of niobium sputtering targets of various
shapes and degrees of purity, which are mainly used in the semiconductor
and microelectronic industries.
Thanks to the special molding processes we used, our niobium sputtering
targets have a higher density, smaller average particle size, and high
purity, and as a result you can benefit from a faster process due to a
higher sputtering speed and get very uniform niobium layers.
The flexibility of our manufacturing process allows us to adjust the
microstructure of our coating material to achieve the desired effect. If
the grain of the spray target is evenly aligned, the user can benefit
from constant erosion rates and uniform layers. The figure below shows
two typical micrographs of our niobium sputtering target, with an
average grain size of ＜ 100 μm.
Chemical purity is critical for metal sputtering targets, if the purity
is higher, the films you have have a more outstanding level of
electrical conductivity and minimize particle formation during the PVD
process. Below is a typical certificate of analysis of a target for
sputtering high purity niobium .
PHYSICAL PROPERTIES
PHASE - Solid
Standard Atomic Weight - Solid
Standard atomic weight - 92.90638 (2) g-mol-1
Melting TEMP - 2750 K, 2477 ° C, 4491 ° F
Boiling Point - 5017 K, 4744 ° C, 8571 ° F
CRYSTAL STRUCTURE - The cubic center of the body
ELECTRICAL DURABILITY - (0 ° C) 152 nOhm · m
HEAT CONDUCTIVITY - (300 K) 53.7 W · m - 1 · K - 1
THERMAL EXPANSION - 7.3 μm / (m · K)
GENERAL PROPERTIES
SYMBOL - Nb
ROOM - 41
ELEMENT CATEGORY: - Transition metals
AVAILABLE PRICES:
Commercial grade (ASTM)
3N 99.9%
GENERAL CHARACTERISTICS
ASTM R04210
o >>Commercial grade (unalloyed)
ASTM R04200
o >>Degree of reactor (unalloyed)
ASTM R04261
o >>Commercial grade niobium 1% zirconium alloy
ASTM R04220
o >>RRR class of pure niobium
AVAILABLE ALLOYS:
Niobium
Niobium 1% zirconium
| Niobium | Cobalt | Iron | Carbon | Sulfur | Copper | Zinc | Lead | Total Impurities | ||
|---|---|---|---|---|---|---|---|---|---|---|
| 99.99 | <0.00002 | 0.002 | <0.01 | 0.0002 | 0.00005 | 0.00005 | 0.00002 | <0.01 |
| Diam | thickness | length | width | purity | Details | ||
|---|---|---|---|---|---|---|---|
|
|
Foil | 0.03mm -0.8mm | >3000mm | 2mm-150mm | 99.99% | Details | |
|
|
sheet | 0.03mm-50mm | 100mm | 100mm | 99.99% | Details | |
|
|
wire | 0.025mm -0.05mm |
7000-8000m | 99.99% | Details | ||
|
|
Stab | 2.0mm -150mm |
<1000mm | 99.99% | Details | ||
|
|
powder | 50nm- 20μm | 99.99% | Details | |||
|
|
Pellets | 6mm-13mm | 99.99% | Details | |||
|
|
granules | 6mm-13mm | 99.99% | Details | |||
|
|
Sputter target |
3mm-300mm | O30--2000mm | 99.99% | Details | ||
|
|
crucible | 30ml-50ml | 99.9% | Details | |||
|
|
mesh | 0.05-2mm | hole:0.3X0.6mm, 0.5X1mm ............20X40mm |
99.9% | Details | ||
|
|
foam | 0.3-10mm | 100mm | 100mm | Details | ||