Target for spraying niobium
Niobium Sputtering Target is made using EB melting technology, it is usually used for touch screens, optical lenses and glass coatings, usually used for touch screens, optical lenses and glass coatings. XK is a professional manufacturer of niobium sputtering targets of various shapes and degrees of purity, which are mainly used in the semiconductor and microelectronic industries.
Thanks to the special molding processes we used, our niobium sputtering targets have a higher density, smaller average particle size, and high purity, and as a result you can benefit from a faster process due to a higher sputtering speed and get very uniform niobium layers.
The flexibility of our manufacturing process allows us to adjust the microstructure of our coating material to achieve the desired effect. If the grain of the spray target is evenly aligned, the user can benefit from constant erosion rates and uniform layers. The figure below shows two typical micrographs of our niobium sputtering target, with an average grain size of ＜ 100 μm.
Chemical purity is critical for metal sputtering targets, if the purity is higher, the films you have have a more outstanding level of electrical conductivity and minimize particle formation during the PVD process. Below is a typical certificate of analysis of a target for sputtering high purity niobium .
PHASE - Solid
Standard Atomic Weight - Solid
Standard atomic weight - 92.90638 (2) g-mol-1
Melting TEMP - 2750 K, 2477 ° C, 4491 ° F
Boiling Point - 5017 K, 4744 ° C, 8571 ° F
CRYSTAL STRUCTURE - The cubic center of the body
ELECTRICAL DURABILITY - (0 ° C) 152 nOhm · m
HEAT CONDUCTIVITY - (300 K) 53.7 W · m - 1 · K - 1
THERMAL EXPANSION - 7.3 μm / (m · K)
SYMBOL - Nb
ROOM - 41
ELEMENT CATEGORY: - Transition metals
Commercial grade (ASTM)
o »Commercial grade (unalloyed)
o »Degree of reactor (unalloyed)
o »Commercial grade niobium 1% zirconium alloy
o »RRR class of pure niobium
Niobium 1% zirconium